Online technology publication Engadget recently visited Intel’s manufacturing facilities in Hillsboro, Oregon, and Santa Clara, California, for an inside look at the extreme ultraviolight lithography (EUV) that Intel has been using in production of its next-generation chips.
Engadget video producer Christopher Schodt writes:
“An evolutionary leap, EUV still projects a chip blueprint onto silicon, but it uses light with an incredibly small wavelength to do so, the better for creating minuscule features.
“At these tiny wavelengths, the UV light is absorbed by nearly everything, and it can’t be generated with a typical laser. The process is far more exotic, involving liquid metal and high energy plasma. The technical challenges are immense, but the payoff is a leap in the speed and energy efficiency of our devices.”
More Context: Global Manufacturing at Intel | The Extreme Physics Pushing Moore’s Law to the Next Level (Seeker)