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Government-Industry Partnership To Develop Advanced Lithography Technology

SAN JOSE, Calif., Sept. 11, 1997 — A private industry consortium, led by Intel Corporation, Advanced Micro Devices and Motorola, have joined forces with the Virtual National Laboratory (VNL) – consisting of three U.S. Department of Energy labs – to launch an advanced lithography research project targeted at increasing computer chip capabilities for the 21st century, the organization announced today. The advanced lithography technology – called Extreme Ultra Violet (EUV) – will allow the industry to etch circuit lines smaller than 0.1 micron widths. This new technology will allow microprocessors to become 100 times more powerful and memory chips to store 1,000 times more information than is currently possible.

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