TOKYO, JAPAN, Sept. 19, 2002 — Intel researchers have developed a three-dimensional (3-D) “tri-gate” transistor design that achieves higher performance with greater power efficiency than traditional planar (flat) transistors. This development provides the first glimpse of a new era of non-planar 3-D transistor designs that Intel and the semiconductor industry must implement to maintain the pace of Moore’s Law beyond this decade.
Intel (NASDAQ: INTC), a leader in the semiconductor industry, is shaping the data-centric future with computing and communications technology that is the foundation of the world’s innovations. The company’s engineering expertise is helping address the world’s greatest challenges as well as helping secure, power and connect billions of devices and the infrastructure of the smart, connected world – from the cloud to the network to the edge and everything in between. Find more information about Intel at newsroom.intel.com and intel.com.
© Intel Corporation. Intel, the Intel logo, and other Intel marks are trademarks of Intel Corporation or its subsidiaries. Other names and brands may be claimed as the property of others.