High NA EUV at Intel

April 18, 2024 Last Updated
April 18, 2024 Published
Technicians in white cleanroom suits and red caps work on a large, complex machine with numerous pipes and control panels in an industrial setting. Some use computers, while others inspect the equipment.

Installation is complete and calibration started on Intel's High Numerical Aperture Extreme Ultraviolet lithography tool in a clean room at Intel Corporation's Fab D1X in Hillsboro, Oregon, in April 2024. The 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system of its kind in the world. The machine will allow Intel Foundry to continue its pursuit of Moore's Law by creating for its customers powerful chips with ever-smaller transistors. (Credit: Intel Corporation)

Intel is industry’s first mover on High NA EUV lithography system.

Intel Foundry has received and assembled the industry’s first High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography system. The new tool provides the ability to dramatically improve resolution and feature scaling for the next generation of processors, enabling Intel Foundry to continue process leadership beyond Intel 18A.

High NA EUV is the next-generation lithography system developed by ASML following decades of collaboration with Intel. As the first mover on High NA EUV, Intel Foundry will be able to deliver never-before-seen precision and scalability in chip manufacturing. This in turn will allow Intel to develop chips with the most innovative features and capabilities – processors that are essential for driving advancements in AI and other emerging technologies.

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Intel’s Core Strengths Maximize the Benefits of High NA EUV – Infographic

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Images

Four people in white protective suits and pink helmets stand in front of a large, complex machine with interconnected components and wiring, working on a computer. The setting appears to be a cleanroom environment in a technology facility.
Engineers in white suits and pink caps operate a large, complex machine in a clean room. The machine is equipped with control panels and intricate components, situated in a bright, sterile environment.
Technicians in white cleanroom suits and red caps work on a large, complex machine with numerous pipes and control panels in an industrial setting. Some use computers, while others inspect the equipment.
A group of people in white cleanroom suits and masks stand in a high-tech laboratory. One person gestures while speaking to the group. A camera on a boom captures the scene, and various technical equipment is visible in the background.
A group of people in cleanroom suits gather around a person who is speaking and gesturing inside a high-tech laboratory with complex machinery. The environment is sterile, with visible equipment and monitors in the background.
Four people in white protective suits and pink helmets stand in front of a large, complex machine with interconnected components and wiring, working on a computer. The setting appears to be a cleanroom environment in a technology facility.
Engineers in white suits and pink caps operate a large, complex machine in a clean room. The machine is equipped with control panels and intricate components, situated in a bright, sterile environment.
Technicians in white cleanroom suits and red caps work on a large, complex machine with numerous pipes and control panels in an industrial setting. Some use computers, while others inspect the equipment.
A group of people in white cleanroom suits and masks stand in a high-tech laboratory. One person gestures while speaking to the group. A camera on a boom captures the scene, and various technical equipment is visible in the background.
A group of people in cleanroom suits gather around a person who is speaking and gesturing inside a high-tech laboratory with complex machinery. The environment is sterile, with visible equipment and monitors in the background.

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Video

Intel Manufacturing in Kulim, Malaysia, and San Jose, Costa Rica (B-Roll)

Intel Adds ASML’s First High NA EUV Tool to Oregon Factory

ASML’s High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography scanner sits in Intel Oregon’s D1X test manufacturing factory, where it is going through its final calibration. It is as big as a double-decker bus and weighs as much as a blue whale. It will shoot lasers at light speed and heat plasma to nearly 220,000 degrees Celsius, almost 40 times hotter than the surface temperature of the sun. The new TWINSCAN EXE: 5000 has the ability to dramatically improve resolution feature scaling for next-generation processors and will enable the continued pursuit of Moore’s Law. (Credit: Intel Corporation)

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